HELIOS G4 SEM
SAL Villach
HELIOS G4 SEM
The Helios G4 is a combined electron / focused ion beam microscope for topography and morphology analysis of micro- and nanostructures as well as the structuring of thereof. The system is equipped with a Bruker EDX detector, which allows to determine the composition of chemical elements in a sample.
Research Services:
- High resolution imaging
- EDX composition analysis
- Cross sections via Focus Ion Beam
- Small surface structurin via Focus Ion Beam
- Ebeam Lithography
Expertise:
Key Specifications:
- Up to 200 mm wafers – stage movement 150 mm x 150 mm
- High resolution SEM imaging with in-lens mode
- Electron column and Ion column (Ga-Ions) up to 30 kV
- Ion beam patterning and Gas injection system for Pt deposition and insulator enhanced etch (XeF2)
- SE detectors: ETD, TLD
- BSE detectors: TLD, MD, ICD, ABS, CBS
- EDX detector
- Software: XT microscope, Maps plugin, Nanobuilder plugin
- Add on 2022 : EBL Lithography capability with the software Elphy Multibeam (RAITH)
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