HEIDELBERG DWL 66
SAL Villach
HEIDELBERG DWL 66
This Laser lithography system is a highly versatile, high-resolution pattern generator for direct writing and low-volume mask making.
Research Services:
- 200 mm down 1 cm2 substrate size
- i-line band (375 nm) for negative and positive resist exposures
- grayscale mode for 2.5D pattering
- minimum feature size 1 um
Expertise:
The Heidelberg DWL 66 is used for R&D) in microelectronics, MEMS, microfluidics, sensors, non-standard substrates and advanced packaging and any academic application that requires microstructure fabrication.
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