OXFORD PECVD 418440
SAL Villach
OXFORD PECVD 418440
Oxford Instruments' PlasmaPro®100 PECVD (Plasma Enhanced Chemical Vapour Deposition) is a versatile instrument that can deposit silicon oxide, silicon nitride, Silicon carbide, amorphous silicon, and other films.
Research Services:
- PECVD deposition of Silicon-based thin films on wafers up to 8“
Expertise:
Material-Portfolio:
- SiNx
- SiO2
- SiC
- a-Si
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