Wet Bench

  • Manufacturer: Puerstinger High Purity Systems GmbH

General Description:

The cleanroom is equipped with 3 wet-benches for solvent, acid and base processes. The tanks have the capacity of 5 wafers of 8”. The solvent bench is mainly dedicated to lift-off processes and is equipped with an ultrasonic bath with 8” substrate capability. The base bench is dedicated to KOH silicon etching and base-based metallic etching solutions. The acid bench is dedicated to wafer cleaning and acid-based thin layers etching solutions.


Key Specifications:

  • Solvent, acid and base manual wet-benches
  • Cleaning, removing and etching purpose
  • Up to 4 Acid tanks, 5x8 inches
  • KOH silicon etching
  • Ultrasonic bath for lift-off processes
  • Miscellaneous chemical processes


Use allowed for all researchers with permission


Cleanroom C5
Europastraße 12
9524 Villach

Responsibles / Contact

Dr. Sarah Risquez
Tel.:+43 4242 56300 275