Resist Track system

General Description:

The Resist Track System is a semi-automatic cluster tool equipment for photoresist patterning of wafers up to 200 mm diameter. It includes an HMDS adhesion vapor primer system (VP8), a photoresist spin coating system (RCD8 coater), a photoresist baking hot plate (HP8) and a puddle photoresist development system (RCD8 developer).

Key Specifications:

• Substrates from 2” up to 8”
• Up to 3 different resist lines for semi-automatic dispense
• Syringe dispensing
• GYRSET® technology
• Hotplate module up to 250°C
• HMDS Primer module up to 125°C