MICROFABRICATION
Resist Track system
- Manufacturer: SÜSS MicroTec
- Model: RCD8 COATER+ VP8+HP8BM+RCD8 DEVELOPER

General Description:
The Resist Track System is a semi-automatic cluster tool equipment for photoresist patterning of wafers up to 200 mm diameter. It includes an HMDS adhesion vapor primer system (VP8), a photoresist spin coating system (RCD8 coater), a photoresist baking hot plate (HP8) and a puddle photoresist development system (RCD8 developer).
Key Specifications:
- Substrates from 2” up to 8”
- Up to 3 different resist lines for semi-automatic dispense
- Syringe dispensing
- GYRSET® technology
- Hotplate module up to 250°C
- HMDS Primer module up to 125°C
Availability | Use allowed for all researchers with permission |
Location | Cleanroom C5 |
Responsibles / Contact | Dr. Sarah Risquez / Dr. Stefano Lumetti |