{"id":6184,"date":"2026-06-09T12:49:27","date_gmt":"2026-06-09T10:49:27","guid":{"rendered":"https:\/\/silicon-austria-labs.com\/?p=6184"},"modified":"2026-07-30T09:37:20","modified_gmt":"2026-07-30T07:37:20","slug":"sal-installiert-erstes-europaeisches-ulvac-nld-5700-tfln-aetzsystem","status":"publish","type":"post","link":"https:\/\/silicon-austria-labs.com\/en\/sal-installiert-erstes-europaeisches-ulvac-nld-5700-tfln-aetzsystem\/","title":{"rendered":"SAL installs first Euro\u00adpean ULVAC NLD-5700 TFLN Etching System"},"content":{"rendered":"<p>Silicon Austria Labs (SAL) has expanded its capa\u00adbil\u00adi\u00adties with the instal\u00adla\u00adtion of the ULVAC NLD-5700 Reac\u00adtive Ion Etching System at its Villach clean\u00adroom facility. The system marks a signif\u00adi\u00adcant mile\u00adstone, using propri\u00adetary plasma tech\u00adnology, further strength\u00adening its posi\u00adtion as a Euro\u00adpean re\u00adsearch partner for industry-driven R&amp;D.<\/p>\n<p>The NLD-5700 intro\u00adduces ULVAC\u2019s Neutral Loop Discharge plasma tech\u00adnology, enabling highly stable and precise dry etching processes tailored for advanced photonics appli\u00adca\u00adtions.<\/p>\n<p>The system offers several distinct tech\u00adno\u00adlog\u00adical advan\u00adtages:<\/p>\n<ul>\n<li>High-density, low-elec\u00adtron-temper\u00ada\u00adture plasma for stable and controlled fine-feature process\u00ading<\/li>\n<li>Excel\u00adlent within-wafer unifor\u00admity on 8-inch wafers, adjustable via Neutral Loop radius<\/li>\n<li>High etch rates, partic\u00adu\u00adlarly at low pres\u00adsures (0.1\u20131 Pa)<\/li>\n<li>High-aspect-ratio etching capa\u00adbility, enabling vertical struc\u00adtures with near-vertical side\u00adwalls<\/li>\n<\/ul>\n<p>&nbsp;<\/p>\n<h2><span style=\"color: #009a9b\">Expanding Process Capa\u00adbil\u00adi\u00adties for Industry<\/span><\/h2>\n<p>With the instal\u00adla\u00adtion of the NLD-5700, SAL signif\u00adi\u00adcantly strengthens its plasma etching port\u00adfolio of TFLN and offers indus\u00adtrial part\u00adners access to a tech\u00adnology plat\u00adform not yet avail\u00adable else\u00adwhere in Europe.<\/p>\n<p>The system is attrac\u00adtive for compa\u00adnies devel\u00adoping next-gener\u00ada\u00adtion inte\u00adgrated photonic compo\u00adnents, RF struc\u00adtures, and advanced sensor tech\u00adnolo\u00adgies where preci\u00adsion, repeata\u00adbility, and vertical profile control are crit\u00adical. Indus\u00adtrial part\u00adners can perform feasi\u00adbility studies, opti\u00admize processes, and vali\u00addate complex device archi\u00adtec\u00adtures within SAL\u2019s state-of-the-art clean\u00adroom envi\u00adron\u00adment.<\/p>\n<p>\u201cWith the first NLD-5700 system in Europe, we are signif\u00adi\u00adcantly expanding our plasma etching capa\u00adbil\u00adi\u00adties for next gener\u00ada\u00adtion of photonics and quantum appli\u00adca\u00adtions,\u201d says Mohssen Moridi, Senior Director at SAL. \u201cThe system provides our indus\u00adtrial part\u00adners with a powerful plat\u00adform for next-gener\u00ada\u00adtion device devel\u00adop\u00adment.\u201d<\/p>\n<p>\u201cThe successful start of full oper\u00ada\u00adtion of the NLD-5700 in Europe is a mile\u00adstone we are truly proud of,\u201d said Harunori Iwai, Exec\u00adu\u00adtive Officer, Special Assign\u00adment, Semi\u00adcon\u00adductor &amp; Elec\u00adtronics Domain at ULVAC. \u201cULVAC will continue to deepen its part\u00adner\u00adship with SAL and work together to drive the growth of photonics and MEMS tech\u00adnolo\u00adgies across the Euro\u00adpean market. Through ongoing inno\u00adva\u00adtion, we aim to contribute to the sustain\u00adable devel\u00adop\u00adment of Europe\u2019s high-tech indus\u00adtries.\u201d<\/p>\n<p>With the NLD-5700 now fully oper\u00ada\u00adtional, SAL further strengthens its role as a Euro\u00adpean compe\u00adtence hub for advanced MEMS and optical process\u00ading \u2014 bridging cutting-edge plasma tech\u00adnology with real indus\u00adtrial appli\u00adca\u00adtion need.<\/p>\n<p>&nbsp;<\/p>\n<h2><span style=\"color: #009a9b\">Contact<\/span><\/h2>\n<p><strong>Lisa Kainz, MA<\/strong><br \/>\nBusi\u00adness Deve\u00adlop\u00adment Micro\u00adsys\u00adtems<\/p>\n<div class=\"idl-button-slide-div\">\n<p><a href=\"\/en\/lisa.kainz@silicon-austria.com\/\">Send E-Mail<\/a><\/p>\n<\/div>","protected":false},"excerpt":{"rendered":"<p>Silicon Austria Labs (SAL) hat seine Kompe\u00adtenzen durch die Instal\u00adla\u00adtion des reak\u00adtiven Ionen\u00ad\u00e4tz\u00adsys\u00adtems ULVAC NLD-5700 in seinem Rein\u00adraum in Villach erwei\u00adtert. Das System stellt einen bedeu\u00adtenden Meilen\u00adstein dar und st\u00e4rkt mit seiner inno\u00adva\u00adtiven Plas\u00adma\u00adtech\u00adno\u00adlogie die Posi\u00adtion von SAL als euro\u00adp\u00e4i\u00adscher Partner f\u00fcr indus\u00adtrie\u00adnahe Forschung und Entwick\u00adlung weiter. Das NLD-5700 nutzt die Neutral Loop Disch\u00adarge (NLD)-Plas\u00adma\u00adtech\u00adno\u00adlogie [&hellip;]<\/p>\n","protected":false},"author":5,"featured_media":6185,"comment_status":"closed","ping_status":"open","sticky":false,"template":"","format":"standard","meta":{"_acf_changed":false,"footnotes":""},"categories":[1],"tags":[],"class_list":["post-6184","post","type-post","status-publish","format-standard","has-post-thumbnail","hentry","category-news"],"acf":{"isevent":false,"location":"","eventdate":null,"eventtime":null},"_links":{"self":[{"href":"https:\/\/silicon-austria-labs.com\/en\/wp-json\/wp\/v2\/posts\/6184","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/silicon-austria-labs.com\/en\/wp-json\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/silicon-austria-labs.com\/en\/wp-json\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/silicon-austria-labs.com\/en\/wp-json\/wp\/v2\/users\/5"}],"replies":[{"embeddable":true,"href":"https:\/\/silicon-austria-labs.com\/en\/wp-json\/wp\/v2\/comments?post=6184"}],"version-history":[{"count":3,"href":"https:\/\/silicon-austria-labs.com\/en\/wp-json\/wp\/v2\/posts\/6184\/revisions"}],"predecessor-version":[{"id":6189,"href":"https:\/\/silicon-austria-labs.com\/en\/wp-json\/wp\/v2\/posts\/6184\/revisions\/6189"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/silicon-austria-labs.com\/en\/wp-json\/wp\/v2\/media\/6185"}],"wp:attachment":[{"href":"https:\/\/silicon-austria-labs.com\/en\/wp-json\/wp\/v2\/media?parent=6184"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/silicon-austria-labs.com\/en\/wp-json\/wp\/v2\/categories?post=6184"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/silicon-austria-labs.com\/en\/wp-json\/wp\/v2\/tags?post=6184"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}